Characterization by XRD and UV-VIS spectrophotometry of ZnO film deposited by pld
DOI:
https://doi.org/10.31908/19098367.772Keywords:
ZnO, PLD, XRD, UV-Vis. Spectrophotometer.Abstract
ZnO films were deposited by pulsed laser ablation employing different temperatures and gas pressures. It was used as a target a tablet made from available commercial ZnO powder. The films were grown on glass substrates treated by chemical Cleanliness.The samples were
characterized by X ray diffraction and Uv-Vis spectrophotometryas a function of substrate temperature and gas pressure. The ZnO exhibits hexagonal wurtzite structure with preferential orientation along c-axis direction. It was found that the best quality films were obtained at substrate temperature of 300ºC and at gas pressure of 26,7Pa. At room temperature films exhibit ZnO hexagonal phase with low crystallinity.At low pressures thin films do not generate ZnO phases.Downloads
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